Ferroelectricity in Doped Hafnium Oxide : Materials, Properties and Devices Paperback / softback
Edited by Uwe (Deputy Scientific Director, Nanoelectronic Materials Laboratory, NaMLab - a TU Dres Schroeder, Cheol Seong (Professor, Department of Materials Science and Engineering, Hybrid Materials, Se Hwang, Hiroshi (Professor, Tokyo Institute of Technology, Japan) Funakubo
Part of the Woodhead Publishing Series in Electronic and Optical Materials series
Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices covers all aspects relating to the structural and electrical properties of HfO2 and its implementation into semiconductor devices, including a comparison to standard ferroelectric materials.
The ferroelectric and field-induced ferroelectric properties of HfO2-based films are considered promising for various applications, including non-volatile memories, negative capacitance field-effect-transistors, energy storage, harvesting, and solid-state cooling.
Fundamentals of ferroelectric and piezoelectric properties, HfO2 processes, and the impact of dopants on ferroelectric properties are also extensively discussed in the book, along with phase transition, switching kinetics, epitaxial growth, thickness scaling, and more. Additional chapters consider the modeling of ferroelectric phase transformation, structural characterization, and the differences and similarities between HFO2 and standard ferroelectric materials.
Finally, HfO2 based devices are summarized.
- Format: Paperback / softback
- Pages: 570 pages
- Publisher: Elsevier Science & Technology
- Publication Date: 29/03/2019
- Category: Electrochemistry & magnetochemistry
- ISBN: 9780081024300