Resolution Enhancement Techniques in Optical Lithography v. TT47 Paperback / softback
by Alfred Kwok-Kit Wong
Part of the Tutorial Texts series
Paperback / softback
Description
The acceleration of integrated circuit miniaturization is challenging lithographers to push the limits of optical lithography by ever more precise engineering and innovations.
As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement techniques.
This work summarizes the latest enhancement research that has matured since the 1980s.
Theoretical and practical aspects of commonly used techniques are discussed, serving students and practising lithographers alike. #Conoptical Imaging And Resolution; Modified Illumination; Optical Proximity Correction; Alternating Phase-Shifting Mask; Attenuated Phase-Shifting Mask; Selecting Appropriate Rets; Second Generation Rets; Concluding Remarks.
Information
-
Item not Available
- Format:Paperback / softback
- Pages:214 pages, Illustrations
- Publisher:SPIE Press
- Publication Date:01/03/2001
- Category:
- ISBN:9780819439956
Information
-
Item not Available
- Format:Paperback / softback
- Pages:214 pages, Illustrations
- Publisher:SPIE Press
- Publication Date:01/03/2001
- Category:
- ISBN:9780819439956
