![Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications, Hardback Book Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications, Hardback Book](http://hive.dmmserver.com/media/640/97808155/9780815512882.jpg)
Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications Hardback
by John E.J. (Philips Semiconductor; former COO of SEMATECH) Schmitz
Hardback
Description
This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume.
The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up.
Materials deposition chemistry, equipment, process technology, developments, and applications are described.
Information
-
Out of stock
- Format:Hardback
- Pages:251 pages
- Publisher:William Andrew Publishing
- Publication Date:31/12/1992
- Category:
- ISBN:9780815512882
Information
-
Out of stock
- Format:Hardback
- Pages:251 pages
- Publisher:William Andrew Publishing
- Publication Date:31/12/1992
- Category:
- ISBN:9780815512882