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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications, Hardback Book

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications Hardback

Hardback

Description

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume.

The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up.

Materials deposition chemistry, equipment, process technology, developments, and applications are described.

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£49.99

 
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