Directed Self-assembly of Block Co-polymers for Nano-manufacturing Hardback
Edited by Roel (IMEC, Belgium) Gronheid, Paul (University of Chicago, USA) Nealey
Part of the Woodhead Publishing Series in Electronic and Optical Materials series
Hardback
Description
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern.
Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA.
Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly.
Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.
Information
-
Only a few left - usually despatched within 24 hours
- Format:Hardback
- Pages:328 pages
- Publisher:Elsevier Science & Technology
- Publication Date:10/08/2015
- Category:
- ISBN:9780081002506
Information
-
Only a few left - usually despatched within 24 hours
- Format:Hardback
- Pages:328 pages
- Publisher:Elsevier Science & Technology
- Publication Date:10/08/2015
- Category:
- ISBN:9780081002506
