Gallium Nitride and Related Materials: Volume 395
R. D. (University of Texas, Austin) Dupuis
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Silicide Thin Films: Volume 402 : Fabrication, Properties and Applications
Leslie H. (University of Illinois, Urbana-Champaign) Allen
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Diagnostic Techniques for Semiconductor Materials Processing: Volume 406
Francis G. Celii
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Optoelectronic Materials: Volume 417 : Ordering, Composition Modulation, and Self-Assembled Structures
Eric D. Jones
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Compound Semiconductor Electronics and Photonics: Volume 421
S. J. (University of Florida) Pearton
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III-Nitride, SiC, and Diamond Materials for Electronic Devices: Volume 423
Charles D. Brandt
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Structure and Evolution of Surfaces: Volume 440
Robert C. (The Johns Hopkins University) Cammarata
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Thin Films - Structure and Morphology: Volume 441
Robert C. Cammarata
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Defects in Electronic Materials II: Volume 442
Thomas Kennedy
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Low-Dielectric Constant Materials II: Volume 443
Helmuth Treichel
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Amorphous and Crystalline Insulating Thin Films - 1996: Volume 446
Sorin Cristoloveanu
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Amorphous and Microcrystalline Silicon Technology - 1997: Volume 467
Michael (Xerox Palo Alto Research Center, Stanford University, C Hack
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Gallium Nitride and Related Materials II: Volume 468
C. R. (University of Florida) Abernathy
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Defects and Diffusion in Silicon Processing: Volume 469
Tomas Diaz de la (Lawrence Livermore National Laboratory, Calif Rubia
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Epitaxial Oxide Thin Films III: Volume 474
Chang-Beom (Duke University, North Carolina) Eom
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Science and Technology of Semiconductor Surface Preparation: Volume 477
Gregg S. Hagashi
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Nitride Semiconductors: Volume 482
F. A. (Xerox Palo Alto Research Center, Stanford University, Ca Ponce
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Semiconductor Process and Device Performance Modelling: Volume 490
Scott T. (Boston University) Dunham
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Amorphous and Microcrystalline Silicon Technology - 1998: Volume 507
Ruud (Universiteit Utrecht, The Netherlands) Schropp
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Defect and Impurity Engineered Semiconductors II: Volume 510
S. (Pennsylvania State University) Ashok
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Hydrogen in Semiconductors and Metals: Volume 513
Norbert H. Nickel
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Silicon Front-End Technology - Materials Processing and Modelling: Volume 532
Nicholas E. B. (Philips Research Laboratories, The Netherlands Cowern
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Chemical-Mechanical Polishing - Fundamentals and Challenges: Volume 566
S. V. (Clarkson University, New York) Babu
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Si Front-End Processing: Volume 568 : Physics and Technology of Dopant-Defect Interactions
Hans-Joachim L. (Lucent Technologies, Liberty Corner, New Je Gossmann
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