Spacer Engineered FinFET Architectures : High-Performance Digital Circuit Applications Hardback
This book focusses on the spacer engineering aspects of novel MOS-based device-circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues.
It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
- Format: Hardback
- Pages: 138 pages, 14 Halftones, black and white; 3 Tables, black and white; 39 Illustrations, color; 49 Ill
- Publisher: Taylor & Francis Inc
- Publication Date: 06/06/2017
- Category: Nanotechnology
- ISBN: 9781498783590