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Spacer Engineered FinFET Architectures : High-Performance Digital Circuit Applications, Hardback Book


This book focusses on the spacer engineering aspects of novel MOS-based device-circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues.

It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.


  • Format: Hardback
  • Pages: 138 pages, 14 Halftones, black and white; 3 Tables, black and white; 39 Illustrations, color; 49 Ill
  • Publisher: Taylor & Francis Inc
  • Publication Date:
  • Category: Nanotechnology
  • ISBN: 9781498783590