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Chemical Solution Deposition of Functional Oxide Thin Films, Paperback / softback Book

Chemical Solution Deposition of Functional Oxide Thin Films Paperback / softback

Edited by Theodor Schneller, Rainer Waser, Marija Kosec, David Payne

Paperback / softback

Description

This is the first text to cover all aspects of solution processed functional oxide thin-films.

Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc.

While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s.

Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films.

Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells.

In the appendix detailed “cooking recipes” for selected material systems are offered.

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