Atomic Layer Deposition : Principles, Characteristics, and Nanotechnology Applications PDF
by Tommi K ri inen, David Cameron, Marja-Leena K ri inen, Arthur Sherman
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Description
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology.
The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.
It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Information
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Download - Immediately Available
- Format:PDF
- Publisher:Wiley
- Publication Date:17/05/2013
- Category:
- ISBN:9781118747421
Other Formats
- EPUB from £148.71
Information
-
Download - Immediately Available
- Format:PDF
- Publisher:Wiley
- Publication Date:17/05/2013
- Category:
- ISBN:9781118747421
