Please note: In order to keep Hive up to date and provide users with the best features, we are no longer able to fully support Internet Explorer. The site is still available to you, however some sections of the site may appear broken. We would encourage you to move to a more modern browser like Firefox, Edge or Chrome in order to experience the site fully.

Supporting your high street Find out how »
Extreme Ultraviolet Lithography, Paperback / softback Book

Extreme Ultraviolet Lithography Paperback / softback

Part of the SPIE Press Monographs series

Paperback / softback

Available to Order - This title is available to order, with delivery expected within 2 weeks

Description

This book covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography.

Lithography costs, which have often influenced the areas of technical focus, are discussed.

Potential improvements to current EUV technology and extensions to future nodes are also covered.

Each topic is approached from the perspective of a practicing lithographer in a wafer fab, in either manufacturing or development, and there are many references at the end of each chapter.

Information

£65.00

Available to Order - This title is available to order, with delivery expected within 2 weeks
Add to Basket
Sign in to add to wishlist
 
Free Home Delivery

on all orders

 
Pick up orders

from local bookshops

Information

Also in the SPIE Press Monographs series

Fourier Transforms Using Mathematica

£41.95

Add to Basket